周艷文，女，1966年4月出生，1988年畢業(yè)于東北大學(xué)，金屬物理專(zhuān)業(yè)，學(xué)士；1988年-2000年，鞍鋼從事金屬材料研究工作，先后聘任為工程師、高級(jí)工程師及東大在企業(yè)碩士生導(dǎo)師；2000年-2005年，英國(guó)University of Salford, 表面工程專(zhuān)業(yè)，博士學(xué)位；2005年至今，遼寧科技大學(xué)，材冶學(xué)院，教授。
主要研究方向
1．磁控濺射等離子體與薄膜生長(zhǎng)關(guān)系；
2．磁控濺射制備光電薄膜。
學(xué)術(shù)論文
1. 趙卓，周艷文，劉悅，真空科學(xué)與技術(shù)，“非平衡磁控濺射二維磁場(chǎng)分布模似計(jì)算”Vol. 30 No. 3, Nay-Jun 2010, 265
2. Yanwen Zhou,Zhou Zhao, Yue Liu and Peter Kelly, “Numerical simulation of magnetron fields under unbalanced and closed-field unbalanced magnetron and the effect on the feature of plasma”, Frontier of Applied Plasma Technology, Volume2, July 2009, 15-19.
3. Yanwen Zhou,Zhuo Zhao, Yie Liu, “Numerical Simulation of Magnetron Fields in Unbalanced and Closed-Field Unbalanced Magnetron”, Plasma Application & Hybrid Functional Materials, Vol.18, March 2009, 17-18.
4. Yanwen Zhou,Zhuo Zhao, “Properties of Multi-Component CrBMoS Coatings by Pulsed Magnetron Sputtering from Powder Targets”, Materials Science & Technology 2009 Conference & Exhibition, October 25-29, 2009, Pittsburgh, US.
5. Y. Zhou, PJ Kelly, QP Sun, ‘The Characteristics of the Plasma in the Powder Rig‘,516 (2008) 332-337.
6. PJ Kelly, A A Onifade, Y Zhou, ect., ‘The Influence of Pulse Frequency and Duty on the Deposition Rate in Pulsed Magnetron Sputtering’ 2007, 4, 246-252.
7. PJ Kelly, Y Zhou‘Zinc Oxide-Based Transparent Conductive Oxide Films Prepared by Pulsed Magnetron Sputtering From Powder Targets: Process Features and Film Properties’，J. Vac. Sci. Technol. A 24(5) Sep/Oct. 2006 1782-1789.
8. PJ Kelly, Y Zhou, etc., ‘Pulsed Magnetron Sputtering of Powder Targets: a New Development tool for multi-component Costings’, 48 SVC Annual Technical Conference Porceedings, (2005) ISSN 0737-5921.